SKU:45900748460
Silicon Nitride Film (LPCVD) on Corning 7980, Film thickness: 1.3um ,10x5x0.5mm
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Ships within 48 hours · Estimated delivery Jul 26 - Jul 31
Description
Silicon Nitride Film (LPCVD) on Corning 7980, Film thickness: 1.3um ,10x5x0.5mmSilicon Nitride Film Si3N4 Film coated by low stress LPCVD method Si3N4 Thickness: 1. 3um + 5% Si3N4 covers both side on Corning 7980 0F fused silica ( Warning: the Si3N4 film may have stressed induced micro cracking resulted from the large difference of thermal expansion coefficient between Si3N4 and SiO2 fused silica ) UV Grade Fused Silica (Corning 0F 7980 HPFS) Size: 10x5x0. 5mm Edge: CNC Ground Surface Quality: 60 40 or beer Non effective Area:
Orientation: (110) +/-3 o
Pore Size: 0
Melting Temperature ~ 700 ºC
Back Surface Finish (N Face)
Formula weight: 40
0mm XRD Plate package
and the thermal couple with the sample holder can be moved inside a quartz tube driven by a magnet manually to find a desirable temperature position inside the tube for evaporation or deposition
Please order our new version air compressor with more HP
Aluminum foil Thickness 16 um
Conductor type: S-C-P
When the pouch cell is fabricated
Optical Transmission Range
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